Effect of time parameters of pulsed bias potential o intrinsic stress in TiN coating deposition from inclined ion beam

In the model of the nonlocal thermoelastic peak of low-energy ion, the formation of intrinsic stress in the coating deposited from inclined ion beam at the pulsed bias potential with different values of pulse frequency f and duration t_p is analyzed. The stress in the TiN coating deposited from Ti ion flux in the mode of the pulsed bias potential at various angles of incidence α and different values of time parameter τ = f t_p is calculated. It is established that in the region 0.01 < τ < 0.2 the stress σ varies non monotonically with increasing α, decreasing up to angles of incidence α approx 70^degre with subsequent growth. The calculated curve σ(τ) coincides with the experimental data at U = 1.5 kV and α = 0.