Published February 27, 2012 | Version v1
Journal article

Mechanical and electronic properties of monolayer MoS2 under elastic strain

  • 1. School of Science, National University of Defense Technology, Changsha 410073 (China)
  • 2. State Key Laboratory for Superlattice and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083 (China)

Description

We present our study on elastic constants and electronic structures of two-dimensional monolayer MoS2 under elastic strain using the first-principles calculations. The in-plane stiffness and Poisson's ratio calculated in the harmonic elastic strain range are found to be 123 N/m and 0.25, indicating that monolayer MoS2 is much softer than graphene. With the uniform strain applied, it is shown that the band gap of monolayer MoS2 undergoes a descent trend as strain increasing. Simultaneously, it is accompanied by two characteristic transitions, namely, direct-to-indirect transition at strain of 0.01 and semiconductor-to-metal transition at strain of 0.10. Furthermore, the effective mass of carriers is also modulated by the applied strain. -- Highlights: ► We study the elastic and electronic properties of monolayer MoS2 under strain. ► The in-plane stiffness and Poisson's ratio are revealed. ► The band gap undergoes a descent trend as strain increasing. ► Direct-to-indirect and semiconductor-to-metal transitions are observed.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.physleta.2012.02.029

Additional details

Identifiers

DOI
10.1016/j.physleta.2012.02.029;
PII
S0375-9601(12)00164-8;

Publishing Information

Journal Title
Physics Letters. A
Journal Volume
376
Journal Issue
12-13
Journal Page Range
p. 1166-1170
ISSN
0375-9601
CODEN
PYLAAG

Optional Information

Copyright
Copyright (c) 2012 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.