On the anomalous temperature dependence of X-ray interference intensity of V3Si

Temperature dependences of the intensities and shift of reflection (440) were determined for polycrystalline V3Si stoichiometric composition within a temperature range of 80-3000K by means of the X-ray diffractometry method in monochromatic radiation of Cu Ksub(α). The temperature dependence of the linear thermal expansion coefficient α(T) is logarithmic. An anomalous increase of relative intensities when the temperature is raised with a pronounced maximum at Tsub(i)=2240K is explained by the influence of electron-phonon and ''strong'' anharmonic interaction on the spectral distribution function of lattice vibrations g(ω). The temperature Tsub(i) is interpreted as a temperature of maximal dynamical stability of the V3Si lattice