Experimental investigation of the low-frequency capacitive response of a plasma sheath
Creators
- 1. Department of Physics, University of Victoria, Victoria, British Columbia, Canada
Description
Several theoretical models are examined for the low-frequency capacitive response of the ion sheath surrounding both planar and cylindrical Langmuir probes in a collisionless plasma. It is found that a recent theoretical approach by Shkarofsky, based on the total probe surface charge derived from Gauss's law, predicts values for both the low-frequency, capacitance and the transient charge flow which are as much as an order of magnitude smaller than that predicted based on the electron current flow caused by the motion of the sheath edge, e.g., Kamke and Rose. This discrepancy is attributed to the neglect by Shkarofsky of the transient ion conduction current through the sheath. Additionally, a recent theory by Rosa for the complex impedance of a planar sheath is seen, in the limit of low frequency, to be in agreement with that predicted following Kamke and Rose. Experimental measurements have been made, for both pulsed and rf-driven probes, of the transient charge flow to the probe and the effective low-frequency sheath capacitance. These measurements show good agreement with the theoretical approach of Kamke and Rose, and Rosa. The plasma was formed in the positive column of a low-pressure helium dc discharge with plasma electron densities and temperatures in the ranges 5 × 1015 −3 × 1016 m−3 and 5 × 105 −7 × 105 °K, respectively. The pulsed probe measurements were made by integrating the probe current response to both small- and large-amplitude negative voltage pulses. The rf measurements were made using a tunnel diode oscillator circuit whose resonant frequency was chosen somewhat below the ion plasma frequency.
Additional details
Additional titles
- Augmented title (English)
- Collisionless plasma, low pressure helium dc discharge, rf measurements, tunnel diode oscillator circuit
Identifiers
- DOI
- 10.1063/1.1661991;
Publishing Information
- Journal Title
- Journal of Applied Physics
- Journal Volume
- 44
- Journal Issue
- 10
- Series
- J. Appl. Phys.
- Journal Page Range
- 4511-4517
- ISSN
- 0021-8979
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 5123239
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- COLLISIONLESS PLASMA; ELECTRIC DISCHARGES; ELECTRICAL PROPERTIES; HELIUM; LANGMUIR FREQUENCY; LANGMUIR PROBE; PLASMA; PLASMA DENSITY; PLASMA DIAGNOSTICS; PLASMA SHEATH; POSITIVE COLUMN
- Descriptors DEC
- ELECTRIC PROBES; ELEMENTS; NONMETALS; PHYSICAL PROPERTIES; PROBES; RARE GASES
Optional Information
- Notes
- Updated automatically by Metadata and Full-Text Enrichment Agent