Published August 2006 | Version v1
Journal article Metadata-only

Strain rate sensitivity of Cu with nanoscale twins

Creators

  • 1. Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 (China)
  • 2. Shenyang National Laboratory for Materials Science (SYNL), Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016 (China) and Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139-4307 (United States)
  • 3. Department of Materials Science and Engineering, Massachusetts Institute of Technology, Cambridge, MA 02139-4307 (United States)

Description

The strain-rate sensitivity of ultrafine-crystalline Cu with different concentrations of nanoscale growth twins is investigated using tensile strain rate jump tests. Higher twin density leads to enhanced rate sensitivity, which decreases mildly with increasing strain rate and strain. Mechanisms underlying these effects are explored through post-deformation transmission electron microscopy

Additional details

Identifiers

DOI
10.1016/j.scriptamat.2006.04.046;
PII
S1359-6462(06)00365-4;

Publishing Information

Journal Title
Scripta Materialia
Journal Volume
55
Journal Issue
4
Journal Page Range
p. 319-322
ISSN
1359-6462
CODEN
SCMAF7

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
38064050
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
AUGMENTATION; COPPER; CRYSTALS; DEFORMATION; DENSITY; ELECTRODEPOSITION; NANOSTRUCTURES; SENSITIVITY; STRAIN RATE; STRAINS; TRANSMISSION ELECTRON MICROSCOPY
Descriptors DEC
DEPOSITION; ELECTROLYSIS; ELECTRON MICROSCOPY; ELEMENTS; LYSIS; METALS; MICROSCOPY; PHYSICAL PROPERTIES; SURFACE COATING; TRANSITION ELEMENTS

Optional Information

Copyright
Copyright (c) 2006 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.