Published July 2013 | Version v1
Journal article

PVD Ti-films for plasma-facing first walls – Part II: Surface analytical observations during Ti gettering in TCSU

  • 1. University of Washington, Department of Materials Science and Engineering, Seattle, WA 98052 (United States)
  • 2. University of Washington, Redmond Plasma Physics Laboratory, Redmond, WA 98052 (United States)
  • 3. Eagle Harbor Technologies, Inc., Seattle, WA 98119 (United States)

Description

Ti gettering was successfully employed in the Translation, Confinement, and Sustainment (TCSU) experiment with dramatic reduction in plasma impurities and fuel recycling rates. Prior to Ti gettering in TCSU, the effect of process parameters on deposited films was studied by carrying out deposition experiments in a test chamber and using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS). During the 1st Ti gettering campaign in TCSU, the evolution of TCSU first wall surface chemistry was monitored using X-ray photoelectron spectroscopy (XPS)

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2013.02.054

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2013.02.054;
PII
S0022-3115(13)00460-1;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
438
Journal Issue
1-3
Journal Page Range
p. 58-63
ISSN
0022-3115
CODEN
JNUMAM

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
45067395
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
DEPOSITS; FILMS; FIRST WALL; GETTERING; PLASMA IMPURITIES; SCANNING ELECTRON MICROSCOPY; SURFACES; X-RAY PHOTOELECTRON SPECTROSCOPY; X-RAY SPECTROSCOPY
Descriptors DEC
ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; IMPURITIES; MICROSCOPY; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY; THERMONUCLEAR REACTOR WALLS

Optional Information

Copyright
Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.