Published July 2013
| Version v1
Journal article
PVD Ti-films for plasma-facing first walls – Part II: Surface analytical observations during Ti gettering in TCSU
- 1. University of Washington, Department of Materials Science and Engineering, Seattle, WA 98052 (United States)
- 2. University of Washington, Redmond Plasma Physics Laboratory, Redmond, WA 98052 (United States)
- 3. Eagle Harbor Technologies, Inc., Seattle, WA 98119 (United States)
Description
Ti gettering was successfully employed in the Translation, Confinement, and Sustainment (TCSU) experiment with dramatic reduction in plasma impurities and fuel recycling rates. Prior to Ti gettering in TCSU, the effect of process parameters on deposited films was studied by carrying out deposition experiments in a test chamber and using scanning electron microscopy (SEM) and energy dispersive X-ray spectroscopy (EDS). During the 1st Ti gettering campaign in TCSU, the evolution of TCSU first wall surface chemistry was monitored using X-ray photoelectron spectroscopy (XPS)
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jnucmat.2013.02.054Additional details
Identifiers
- DOI
- 10.1016/j.jnucmat.2013.02.054;
- PII
- S0022-3115(13)00460-1;
Publishing Information
- Journal Title
- Journal of Nuclear Materials
- Journal Volume
- 438
- Journal Issue
- 1-3
- Journal Page Range
- p. 58-63
- ISSN
- 0022-3115
- CODEN
- JNUMAM
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45067395
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- DEPOSITS; FILMS; FIRST WALL; GETTERING; PLASMA IMPURITIES; SCANNING ELECTRON MICROSCOPY; SURFACES; X-RAY PHOTOELECTRON SPECTROSCOPY; X-RAY SPECTROSCOPY
- Descriptors DEC
- ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; IMPURITIES; MICROSCOPY; PHOTOELECTRON SPECTROSCOPY; SPECTROSCOPY; THERMONUCLEAR REACTOR WALLS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.