Published February 2011
| Version v1
Journal article
Beam profile rapid-evaluation of heavy-ion micro-beam in the atmosphere using improved etching method for CR-39 and semi-automatic image analysis
Creators
- 1. Japan Atomic Energy Agency, Quantum Beam Science Directorate, Takasaki, Gunma (Japan)
- 2. Japan Atomic Energy Agency, Takasaki Advanced Radiation Research Inst., Takasaki, Gunma (Japan)
Description
To achieve the rapid-evaluation of heavy-ion microbeam profile in the atmosphere, we investigated the improved etching method of CR-39 and semi-sutomatic image analysis. These processes could be reduced down to only one-twelfth and one-thirtieth of that of the conventional method, respectively. Also, the beam-profile was simulated by the SRIM software. These facts made it sure that this present method was worth enough for the rapid-evaluation. (author)
Availability note (English)
Available from http://dx.doi.org/10.3769/radioisotopes.60.47Additional details
Identifiers
Publishing Information
- Journal Title
- Radioisotopes (Tokyo)
- Journal Volume
- 60
- Journal Issue
- 2
- Journal Page Range
- p. 47-53
- ISSN
- 0033-8303
INIS
- Country of Publication
- Japan
- Country of Input or Organization
- Japan
- INIS RN
- 42102403
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- ARGON 40 BEAMS; BEAM FOCUSING MAGNETS; CARBON 12 BEAMS; ETCHING; IMAGE PROCESSING; ION BEAM INJECTION; LOCAL IRRADIATION; MEV RANGE 10-100; MONTE CARLO METHOD; NEON 20 BEAMS; POSITIONING; SILICON NITRIDES
- Descriptors DEC
- BEAM INJECTION; BEAMS; CALCULATION METHODS; ENERGY RANGE; EQUIPMENT; ION BEAMS; IRRADIATION; MAGNETS; MEV RANGE; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; PROCESSING; SILICON COMPOUNDS; SURFACE FINISHING
Optional Information
- Notes
- 10 refs., 7 figs., 1 tab.