Influence of operating parameters on discharge characteristic of planar DC magnetron

A 2D self-consistent PIC/MCC software OOPIC is used to simulate the plasma properties in the planar dc magnetron sputtering system, and then the influence of parameters such as the magnetic field, cathode voltage and gas pressure on the discharge characteristics is discussed. The results show that, in a definite range of operation parameters, the sheath thickness becomes narrower and the sheath potential fall (SPF) reduces, the ion density on the cathode (IDOTC) increases but its distribution becomes narrower as the magnetic field is strengthened; the sheath thickness becomes a little narrower and SPF increases, IDOTC increases and the distribution becomes wider as the increase of cathode voltage; the sheath thickness keeps constant almost and SPF increases, IDOTC increases firstly and then decreases, the distribution becomes a little wider as the increase of gas pressure. (authors)