Published 2000 | Version v1
Miscellaneous

Nitride etching supported by plasma

  • 1. Instytut Mikroelektroniki i Optoelektroniki, Politechnika Warszawska, Warsaw (Poland)

Description

no abstract available

Part of:
Abstracts book of 7. Scientific Conference 'Electronic Technology' ELTE 2000

Additional details

Additional titles

Original title (Polish)
Trawienie azotkow wspomagane plazma

Publishing Information

Imprint Title
Abstracts book of 7. Scientific Conference 'Electronic Technology' ELTE 2000
Imprint Pagination
[RP 1-9; RS 1; ME 1-78; MN 1-58; F 1-73; TP 1-48; MG 1-16; MS 1-51]
Journal Page Range
p. TP, 36

Conference

Title
7. Scientific Conference 'Electronic Technology' ELTE 2000
Original Conference Title
7. Konferencja Naukowa 'Technologia Elektronowa' ELTE 2000
Dates
18-22 Sep 2000
Place
Polanica-Zdroj (Poland)

INIS

Country of Publication
Poland
Country of Input or Organization
Poland
INIS RN
32031696
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
No Abstract, Conference, Non-conventional Literature
Descriptors DEI
ALUMINIUM NITRIDES; BORON NITRIDES; ETCHING; PLASMA; SILICON; SUBSTRATES; SURFACE PROPERTIES
Descriptors DEC
ALUMINIUM COMPOUNDS; BORON COMPOUNDS; ELEMENTS; NITRIDES; NITROGEN COMPOUNDS; PNICTIDES; SEMIMETALS; SURFACE FINISHING

Optional Information

Notes
1 ref Imprint:Zbior streszczen 7. Konferencja Naukowa 'Technologia Elektronowa' ELTE 2000