Published June 2, 2003 | Version v1
Journal article

Erbium doping into thin carbon optical layers

Description

Study of fabrication and properties of the carbon layers by using the plasma assisted chemical vapour deposition apparatus is reported. The layers were grown on silicon substrates with methane as the precursor. The fabricated samples were then doped with Er3+ by treating them in solution of erbium nitrate in glycerin. To obtain deeper erbium containing carbon layers the 'sandwich method' was used based on repetition (three times) of carbon deposition and subsequent Er3+ diffusion of erbium after which followed annealing in vacuum oven. The obtained results proved that it is in principle possible to fabricate the erbium containing carbon thin optical layers

Additional details

Identifiers

DOI
10.1016/S0040-6090;
PII
S0040609003003936;

Publishing Information

Journal Title
Thin Solid Films
Journal Volume
433
Journal Issue
1-2
Journal Page Range
p. 363-366
ISSN
0040-6090
CODEN
THSFAP

Conference

Title
12. international conference on thin films
Dates
15-20 Sep 2002
Place
Bratislava (Slovakia)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37013339
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ANNEALING; CARBON; CHEMICAL VAPOR DEPOSITION; DIFFUSION; DOPED MATERIALS; ERBIUM; ERBIUM IONS; ERBIUM NITRATES; FABRICATION; GLYCEROL; LAYERS; PLASMA; SILICON
Descriptors DEC
ALCOHOLS; CHARGED PARTICLES; CHEMICAL COATING; DEPOSITION; ELEMENTS; ERBIUM COMPOUNDS; HEAT TREATMENTS; HYDROXY COMPOUNDS; IONS; MATERIALS; METALS; NITRATES; NITROGEN COMPOUNDS; NONMETALS; ORGANIC COMPOUNDS; OXYGEN COMPOUNDS; RARE EARTH COMPOUNDS; RARE EARTHS; SEMIMETALS; SURFACE COATING

Optional Information

Copyright
Copyright (c) 2003 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.