Published May 1, 2017 | Version v1
Journal article Metadata-only

Growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach

Creators

  • 1. Provincial Key Laboratory of Plasma Chemistry and Advanced Materials, Wuhan Institute of Technology, Wuhan 430073 (China)
  • 2. Key Laboratory of Marine New Materials and Related Technology, Zhejiang Key Laboratory of Marine Materials and Protection Technology, Ningbo Institute of Material Technology and Engineering, Chinese Academy of Sciences, Ningbo 315201 (China)

Description

In this study, growth of mirror-like ultra-nanocrystalline diamond (UNCD) films by a facile hybrid CVD approach was presented. The nucleation and deposition of UNCD films were conducted in microwave plasma CVD (MPCVD) and direct current glow discharge CVD (DC GD CVD) on silicon substrates, respectively. A very high nucleation density (about 1 × 1011 nuclei cm−2) was obtained after plasma pretreatment. Furthermore, large area mirror-like UNCD films of Φ 50 mm were synthesized by DC GD CVD. The thickness and grain size of the UNCD films are 24 μ m and 7.1 nm, respectively. In addition, the deposition mechanism of the UNCD films was discussed. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/2058-6272/aa57f7

Additional details

Identifiers

DOI
10.1088/2058-6272/aa57f7;

Publishing Information

Journal Title
Plasma Science and Technology
Journal Volume
19
Journal Issue
5
Journal Page Range
[6 p.]
ISSN
1009-0630

INIS

Country of Publication
China
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
49070251
Subject category
S36: MATERIALS SCIENCE; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Descriptors DEI
CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALS; DIAMONDS; DIRECT CURRENT; GLOW DISCHARGES; GRAIN SIZE; MICROWAVE RADIATION; NANOSTRUCTURES; NUCLEATION; PLASMA; SILICON; THIN FILMS
Descriptors DEC
CARBON; CHEMICAL COATING; CURRENTS; DEPOSITION; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTROMAGNETIC RADIATION; ELEMENTS; FILMS; MICROSTRUCTURE; MINERALS; NONMETALS; RADIATIONS; SEMIMETALS; SIZE; SURFACE COATING