Published February 15, 1983 | Version v1
Journal article Metadata-only

Pulsed UV laser Raman spectroscopy of silane in a linear-flow chemical vapor deposition reactor

Creators

  • 1. Sandia National Laboratories, Albuquerque, New Mexico 87185

Description

For the first time, spatially resolved relative concentrations of silane inside a chemical vapor deposition reactor have been measured with spontaneous Raman spectroscopy using the third harmonic of a Q-switched neodymium:yttrium aluminum garnet laser. Concentration profiles were obtained under both atmospheric and low total pressure conditions. Considerable depletion of silane in the gas phase was observed

Additional details

Publishing Information

Journal Title
Appl. Phys. Lett.
Journal Volume
42
Journal Issue
4
Series
Appl. Phys. Lett.
Journal Page Range
395-397
ISSN
0003-6951

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
14754337
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
ALUMINIUM OXIDES; CHEMICAL VAPOR DEPOSITION; FERRITE GARNETS; HARMONICS; LASER RADIATION; LOW PRESSURE; MEDIUM PRESSURE; NEODYMIUM LASERS; PULSES; Q-SWITCHING; QUANTITY RATIO; RAMAN EFFECT; SILANES; SPATIAL RESOLUTION; SPECTROSCOPY; ULTRAVIOLET RADIATION; YTTRIUM COMPOUNDS
Descriptors DEC
ALUMINIUM COMPOUNDS; AMPLIFIERS; CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; ELECTROMAGNETIC RADIATION; EQUIPMENT; HYDRIDES; HYDROGEN COMPOUNDS; LASERS; MINERALS; OSCILLATIONS; OXIDES; OXYGEN COMPOUNDS; RADIATIONS; RESOLUTION; SILICON COMPOUNDS; SOLID STATE LASERS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS