Published 1985 | Version v1
Book

The density of sputtered MoS2 films

Creators

  • 1. DFVLR, Stuttgart (Germany, F.R.). Inst. fuer Technische Physik

Description

Methods for the determination of the density of sputtered films of MoS2 are discussed and the problems connected with the determination of the film thickness are elucidated. The density determined for different coating parameters is given and the results are compared with the data of natural MoS2. The deviation from the bulk value is explained by morphological properties of the films. In addition, the influence of sputtering conditions on the structure of the films is mentioned and the results are correlated with these data. (author)

Additional details

Publishing Information

Publisher
CEP Consultants Ltd.
Imprint Place
Edinburgh (UK)
Imprint Title
IPAT 85
Imprint Pagination
507 p.
Journal Page Range
p. 272-276.

Conference

Title
5. international conference.
Acronym
Ion and plasma assisted techniques
Dates
May 1985.
Place
Munich (Germany, F.R.).

INIS

Country of Publication
United Kingdom
Country of Input or Organization
United Kingdom
INIS RN
18058774
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
DENSITY; MICROSTRUCTURE; MOLYBDENUM SULFIDES; SPUTTERING; THICKNESS; THIN FILMS
Descriptors DEC
CHALCOGENIDES; CRYSTAL STRUCTURE; DIMENSIONS; FILMS; MOLYBDENUM COMPOUNDS; PHYSICAL PROPERTIES; SULFIDES; SULFUR COMPOUNDS; TRANSITION ELEMENT COMPOUNDS