Published February 21, 2008 | Version v1
Journal article

Magnetic and transport properties in metal-oxide-semiconductor structures of Co3Mn2O/SiO2/Si

  • 1. Department of Physics, Shanghai Jiao Tong University, Shanghai 200240 (China)
  • 2. Department of Physics, Nanjing University, Nanjing 210093 (China)

Description

Magnetic and transport properties were investigated in metal-oxide-semiconductor structures of Co3Mn2O/SiO2/Si prepared by the dc magnetron sputtering technique. Magnetic studies reveal that Co3Mn2O is a granular film consisting of CoO, MnO, Co and Mn. The effective resistance shows a marked transition for temperature at around 240 K. Both negative magnetoresistance {MR = [R(H) - R(0)]/R(0) x 100%} of -11% at 4.2 K and a large anomalous positive magnetoresistace of 70% at 300 K at a magnetic field of 6 T were observed. These phenomena can be explained by the conducting channel switching from the upper film to the Si inversion layer

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/41/4/045005

Additional details

Identifiers

DOI
10.1088/0022-3727/41/4/045005;
PII
S0022-3727(08)63631-1;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
41
Journal Issue
4
Journal Page Range
[5 p.]
ISSN
0022-3727
CODEN
JPAPBE