Published February 7, 2003
| Version v1
Journal article
Atomic nanofabrication: atomic deposition and lithography by laser and magnetic forces
Creators
- 1. Institut fuer Angewandte Physik, Rheinische Friedrich-Wilhelms-Universitaet Bonn, Wegelerstr. 8, D-53115 Bonn (Germany)
Description
Atomic deposition on a surface can be controlled at the nanometre scale by means of optical and magnetic forces. Impingement of atoms on the surface can lead to growth of a structured array (direct deposition) or to chemical modifications of the surface (neutral atom lithography). In this report we survey requirements, present the current results, and explore the potential applications of this method of nanofabrication. (topical review)
Availability note (English)
Available online at http://stacks.iop.org/0022-3727/36/R17/d303r2.pdf or at the Web site for the Journal of Physics. D, Applied Physics (ISSN 1361-6463) http://www.iop.org/Additional details
Identifiers
- URL
- http://stacks.iop.org/0022-3727/36/R17/d303r2.pdf; http://www.iop.org/;
- PII
- S0022-3727(03)02879-1;
Publishing Information
- Journal Title
- Journal of Physics. D, Applied Physics
- Journal Volume
- 36
- Journal Issue
- 3
- Journal Page Range
- p. R17-R38
- ISSN
- 0022-3727
- CODEN
- JPAPBE
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 34021368
- Subject category
- S71: CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS;
- Descriptors DEI
- DEPOSITION; FABRICATION; IMPINGEMENT; INTERATOMIC FORCES; LASERS; MAGNETIC FIELDS; NANOSTRUCTURE; SURFACES