Published November 2006
| Version v1
Journal article
A time-dependent analytical sheath model for dual-frequency capacitively coupled plasma
Creators
- 1. State Key Lab of Materials Modification by Beams, Department of Physics, Dalian University of Technology, Dalian, 116023 (China)
Description
The time-dependent model of the ion motion is used to study characteristics of dual-frequency (DF) capacitive sheaths. The model assumes that both the ion density and velocity vary with time, but time-derivative terms are neglected. Analytical expressions of the instantaneous electron sheath edge and the sheath potential are obtained with the assumption of a step-like electron density profile. It is shown that the present model can give monotonic spatial distributions of the sheath potential and ion density within the DF sheath. The dependence of the maximum sheath thickness and sheath voltage on the ratio of two frequencies or currents is also discussed
Additional details
Identifiers
- DOI
- 10.1063/1.2372757;
Publishing Information
- Journal Title
- Physics of Plasmas
- Journal Volume
- 13
- Journal Issue
- 11
- Journal Page Range
- p. 113502-113502.7
- ISSN
- 1070-664X
- CODEN
- PHPAEN
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 38023365
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Descriptors DEI
- BOUNDARY LAYERS; ELECTRIC CURRENTS; ELECTRON DENSITY; ELECTRONS; ION DENSITY; IONS; PLASMA; PLASMA DENSITY; PLASMA POTENTIAL; PLASMA SHEATH; RADIATION TRANSPORT; SPATIAL DISTRIBUTION; TIME DEPENDENCE
- Descriptors DEC
- CHARGED PARTICLES; CURRENTS; DISTRIBUTION; ELECTRIC POTENTIAL; ELEMENTARY PARTICLES; FERMIONS; LAYERS; LEPTONS
Optional Information
- Notes
- (c) 2006 American Institute of Physics