Published August 15, 2009 | Version v1
Journal article

Shallow surface etching of organic and inorganic compounds by electrospray droplet impact

  • 1. Clean Energy Research Center, University of Yamanashi, Takeda-4, Kofu 400-8511 (Japan)
  • 2. Japan Science and Technology Agency, Naka-ku, Hamamatsu 432-8561 (Japan)
  • 3. Electron Optics Sales Division, JEOL Ltd., 2-8-3 Akebono, Tachikawa, Tokyo 190-0012 (Japan)

Description

The electrospray droplet impact (EDI) was applied to bradykinin, polyethylene terephthalate (PET), SiO2/Si, and indium phosphide (InP). It was found that bradykinin deposited on the stainless steel substrate was ionized/desorbed without the accumulation of radiation products. The film thickness desorbed by a single collisional event was found to be less than 10 monolayers. In the EDI mass spectra for PET, several fragment ions were observed but the XPS spectra did not change with prolonged cluster irradiation. The etching rate for SiO2 by EDI was measured to be ∼0.2 nm/min. The surface roughness of InP etched by EDI was found to be one order of magnitude smaller than that etched by 3 keV Ar+ for about the same etching depths. EDI is capable of shallow surface etching with little damage left on the etched surface.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.apsusc.2009.06.101

Additional details

Identifiers

DOI
10.1016/j.apsusc.2009.06.101;
PII
S0169-4332(09)00947-7;

Publishing Information

Journal Title
Applied Surface Science
Journal Volume
255
Journal Issue
21
Journal Page Range
p. 8947-8952
ISSN
0169-4332
CODEN
ASUSEE

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.