Temperature dependent structural, optical and hydrophobic properties of sputtered deposited HfO2 films
Creators
- 1. Institute Instrumentation Centre, IIT Roorkee (India)
- 2. Department of Electrical Engineering, IIT Roorkee (India)
Description
Hafnium oxide being high-k dielectric has been successfully utilized in electronic and optical applications. Being thermodynamically stable and having good mechanical strength, it can be used as a protective coating for outdoor HV insulators which are suffering from surface flashover problem due to contamination. In this paper, we are investigating the effect of substrate temperature on structural, optical and hydrophobic properties of hafnium oxide coating deposited over glass insulators by DC magnetron sputtering. X-ray diffraction is applied to determine the crystalline phase and crystallite size of the film. The morphology of the samples is examined using atomic force microscopy. The optical properties are studied using UV-vis-NIR spectrophotometer. The wettability of the film is investigated using contact angle meter. The thickness is measured using surface profilometer and verified through optical data. The relationship between substrate temperature with grain size, roughness, refractive index, and hydrophobicity is manifested. The maximum contact angle for HfO2 film was found to be 106° at 400°C
Additional details
Identifiers
- DOI
- 10.1063/1.4861972;
Publishing Information
- Journal Title
- AIP Conference Proceedings
- Journal Volume
- 1576
- Journal Issue
- 1
- Journal Page Range
- p. 29-32
- ISSN
- 0094-243X
- CODEN
- APCPCS
Conference
- Title
- 2. international conference on optoelectronic materials and thin films for advanced technology
- Acronym
- OMTAT 2013
- Dates
- 3-5 Jan 2013
- Place
- Kochi, Kerala (India)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45085248
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; DEPOSITS; DIELECTRIC MATERIALS; FILMS; GRAIN SIZE; HAFNIUM OXIDES; MAGNETRONS; SPUTTERING; SUBSTRATES; TEMPERATURE DEPENDENCE; X-RAY DIFFRACTION
- Descriptors DEC
- CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; HAFNIUM COMPOUNDS; MATERIALS; MICROSCOPY; MICROSTRUCTURE; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; REFRACTORY METAL COMPOUNDS; SCATTERING; SIZE; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Notes
- (c) 2014 AIP Publishing LLC