Published January 28, 2014 | Version v1
Journal article

Temperature dependent structural, optical and hydrophobic properties of sputtered deposited HfO2 films

  • 1. Institute Instrumentation Centre, IIT Roorkee (India)
  • 2. Department of Electrical Engineering, IIT Roorkee (India)

Description

Hafnium oxide being high-k dielectric has been successfully utilized in electronic and optical applications. Being thermodynamically stable and having good mechanical strength, it can be used as a protective coating for outdoor HV insulators which are suffering from surface flashover problem due to contamination. In this paper, we are investigating the effect of substrate temperature on structural, optical and hydrophobic properties of hafnium oxide coating deposited over glass insulators by DC magnetron sputtering. X-ray diffraction is applied to determine the crystalline phase and crystallite size of the film. The morphology of the samples is examined using atomic force microscopy. The optical properties are studied using UV-vis-NIR spectrophotometer. The wettability of the film is investigated using contact angle meter. The thickness is measured using surface profilometer and verified through optical data. The relationship between substrate temperature with grain size, roughness, refractive index, and hydrophobicity is manifested. The maximum contact angle for HfO2 film was found to be 106° at 400°C

Additional details

Identifiers

Publishing Information

Journal Title
AIP Conference Proceedings
Journal Volume
1576
Journal Issue
1
Journal Page Range
p. 29-32
ISSN
0094-243X
CODEN
APCPCS

Conference

Title
2. international conference on optoelectronic materials and thin films for advanced technology
Acronym
OMTAT 2013
Dates
3-5 Jan 2013
Place
Kochi, Kerala (India)

Optional Information

Notes
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