Published January 26, 2009 | Version v1
Journal article

Epitaxy of Ge-Sb-Te phase-change memory alloys

  • 1. Paul Drude Institute for Solid State Electronics, Hausvogteiplatz 5-7, 10117 Berlin (Germany)
  • 2. Center for Applied Near-Field Optics Research, National Institute of Advanced Industrial Science and Technology, Tsukuba Central 4, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8562 (Japan)

Description

The authors demonstrate the epitaxy of Ge-Sb-Te alloys close to the Ge2Sb2Te5 composition on GaSb(001). Using molecular beam epitaxy with elemental sources, amorphous films are obtained at growth temperatures below 120 deg. C and films with a cubic structure and a predominant cube-on-cube epitaxial relationship above 180 deg. C. Using a high-power pulsed laser, the epitaxial films are switched between the crystalline and the amorphous phases. Streaks in the diffraction data help to resolve the apparent ambiguity in interatomic distances between earlier x-ray absorption and powder diffraction measurements. The structural changes are confirmed by Raman spectroscopy

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
94
Journal Issue
4
Journal Page Range
p. 041902-041902.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2009 American Institute of Physics