Published August 26, 1975 | Version v1
Patent Open

Combustion driven NF3 chemical laser

Description

Stable, inert, non-corrosive nitrogen trifluoride gas and an inorganic source of hydrogen or deuterium gas are used as reactants in a compact combustion driven chemical laser. Nitrogen trifluoride is introduced into the combustion chamber of a chemical laser together with a hydrogen source selected from hydrogen, hydrazine, ammonia, acetylene, or benzene and the deuterated isotopes thereof and an optional inert diluent gas wherein the nitrogen trifluoride and the hydrogen- or deuterium-source gas hypergolically reacted upon heating to initiation temperature. Dissociated products from the reaction pass into a laser cavity at supersonic velocities where they are reacted with a source gas which is the isotopic opposite of the gas introduced into the combustor and which has been heated by regenerative cooling. Excited molecules of hydrogen fluoride or deuterium fluoride produce laser radiation which leaves the optical resonator cavity transversely to the flow of gases

Availability note (English)

MF available from INIS under the Report Number.

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Additional details

Additional titles

Original title (Dutch)
Chemische verbrandingslaser, alsmede werkwijze voor het continubedrijf van een dergelijke laser

Publishing Information

Imprint Pagination
12 p.
IPC:
Int. Cl. H01s3/22.
IPC
Int. Cl. H01s3/22.
Patent number
NL patent document 7510040/A/

Optional Information

Notes
Priority 11 Sep 1974, USA; 1 fig.