Published October 2013 | Version v1
Journal article

Effects of Contact Geometry on the Transport Properties of a Silicon Atom

  • 1. Key Laboratory of High Energy Density Physics and Technology of Ministry of Education, College of Physical Science and Technology, Sichuan University, Chengdu 610064 (China)

Description

Contact geometry and electronic transport properties of a silicon atom sandwiched between Au electrodes in three different anchoring configurations are investigated by using the density functional theory combined with the non-equilibrium Green function method. We simulate the nanoscale junction breaking process and calculate the corresponding cohesion energy, obtain the equilibrium conductance and the projected density of states of junctions in an optimal postion. We also calculate the conductance and the current of junctions at the equilibrium position under small bias voltage. It is found that all junctions have large conductance and show a linear I—V relationship, but the current and conductance of a hollow-hollow configuration is always the biggest under the voltage range of −1.2 V∼1.2V. The calculated results proved that the coupling morphology of a silicon atom connected with electrodes has an important effect on the electronic transport properties of the nanoscale junction

Availability note (English)

Available from http://dx.doi.org/10.1088/0256-307X/30/10/107303

Additional details

Publishing Information

Journal Title
Chinese Physics Letters
Journal Volume
30
Journal Issue
10
Journal Page Range
[4 p.]
ISSN
0256-307X
CODEN
CPLEEU