Published October 1, 1972 | Version v1
Journal article Metadata-only

Densities of amorphous Si films by nuclear backscattering

Creators

Description

The backscattering of 2500-keV alpha particles is used to measure the densities of amorphous Si films. The density of amorphous Si is found to be inversely proportional to the electron spin resonance signals. The extrapolated density at zero spins is equal to 1.01 ± 0.02 times that of crystalline Si. The highest density achieved in a real amorphous film was 0.97 ± 0.02 times the crystalline density.

Additional details

Identifiers

DOI
10.1063/1.1654388;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
21
Journal Issue
7
Series
Appl. Phys. Lett.
Journal Page Range
305-307
ISSN
0003-6951

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
4051213
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Descriptors DEI
ALPHA PARTICLES; AMORPHOUS STATE; BACKSCATTERING; DENSITY; ELECTRON SPIN RESONANCE; FILMS; MEV RANGE 01-10; POROSITY; SILICON; VOIDS
Descriptors DEC
CHARGED PARTICLES; ELEMENTS; ENERGY RANGE; MAGNETIC RESONANCE; MEV RANGE; PHYSICAL PROPERTIES; RESONANCE; SCATTERING; SEMIMETALS

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