Published June 2009 | Version v1
Journal article

Influence of substrate temperature in BiFeO3-CoFe2O4 nanocomposites deposited on SrTiO3 (0 0 1)

  • 1. Institut de Ciencia de Materials de Barcelona-CSIC, Campus de la UAB, Bellaterra E-08193, Barcelona (Spain)
  • 2. Institut Catala de Recerca i Estudis Avancats (ICREA), Barcelona (Spain)
  • 3. Fisica Aplicada i Optica and Institut de Nanociencia i Nanotecnologia (IN2UB), Universitat de Barcelona, Diagonal 647, E-08028 Barcelona (Spain)
  • 4. DPMC, University of Geneva, 24 Quai Ernest Ansertmet, CH 1211 Geneva 4 (Switzerland)

Description

BiFeO3-CoFe2O4 epitaxial nanocomposites have been deposited on SrTiO3 (0 0 1) substrates by pulsed laser deposition. We present here a study of the influence of the deposition temperature (TS), in the 550-800 oC range, on the film composition, morphology and microstructure. Electron-probe microanalysis shows strong reduction of the Bi content in the films when increasing TS. Films prepared at TS=750 oC and above are virtually Bi-free. X-ray diffraction (XRD) data show that, due to the volatility of Bi, there is a progressive reduction in the amount of BiFeO3. The deposition temperature and the concomitant presence of FexOy spurious phases in the nanocomposites grown at high temperature promote radical changes in film morphology and magnetization. It thus follows that a temperature range suitable for controlled modification of nanocomposites morphology would be extremely narrow.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jmmm.2009.02.016

Additional details

Identifiers

DOI
10.1016/j.jmmm.2009.02.016;
PII
S0304-8853(09)00056-0;

Publishing Information

Journal Title
Journal of Magnetism and Magnetic Materials
Journal Volume
321
Journal Issue
11
Journal Page Range
p. 1790-1794
ISSN
0304-8853
CODEN
JMMMDC

Conference

Title
Symposium F - Multiferroics and magnetoelectrics materials
Acronym
E-MRS conference
Dates
26-30 May 2008
Place
Strasbourg (France)

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.