Published April 30, 2009 | Version v1
Journal article

Capture efficiency for clustering reaction between charged defects in β-SiC

  • 1. Institute of Advanced Energy, Kyoto University, Gokasho, Uji, Kyoto 611-0011 (Japan)

Description

In order to investigate the formation kinetics of interstitial loops in β-SiC during irradiation, a capture efficiency of a charged point defect to a charged sink was derived taking into account electric interaction between the defects. The derived capture efficiency depends much on effective charges of defects. For defect accumulation in β-SiC under high-energy electron irradiation, the numerical analysis using the rate theory based model with the capture efficiency was performed, and the calculation results indicate that an interstitial loop grows while keeping its charge to be as neutral as possible, leading to the suppression of the growth of interstitial loops. Roughly speaking, the calculated concentration of clustered interstitials with effective charges approaches to the experimental data. It implies that the capture efficiency derived in the present work may play an important role for better reproducing of the experimental result.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.jnucmat.2008.12.098

Additional details

Identifiers

DOI
10.1016/j.jnucmat.2008.12.098;
PII
S0022-3115(08)00840-4;

Publishing Information

Journal Title
Journal of Nuclear Materials
Journal Volume
386-388
Journal Page Range
p. 199-202
ISSN
0022-3115
CODEN
JNUMAM

Conference

Title
13. international conference on fusion reactor materials
Dates
10-14 Dec 2007
Place
Nice (France)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
41059247
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CAPTURE; DEFECTS; EFFECTIVE CHARGE; EFFICIENCY; ELECTRONS; INTERSTITIALS; IRRADIATION; NUMERICAL ANALYSIS; SILICON CARBIDES
Descriptors DEC
CARBIDES; CARBON COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MATHEMATICS; POINT DEFECTS; SILICON COMPOUNDS

Optional Information

Copyright
Copyright (c) 2009 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.