Friction control by engineering the crystallographic orientation of the lubricating few-layer MoS2 films
Creators
- 1. Centre for Advanced Materials Application, Dubravska cesta 9, 845 11 Bratislava (Slovakia)
- 2. Institute of Physics, Slovak Academy of Sciences, Dubravska cesta 9, 845 11 Bratislava (Slovakia)
- 3. Institute of Electrical Engineering SAS, Dubravska cesta 9, 841 04 Bratislava (Slovakia)
- 4. Faculty of Mathematics, Physics and Informatics, Comenius University, Mlynska dolina F1, 842 48 Bratislava (Slovakia)
Description
Highlights: • Crystallographic orientation of MoS2 influences its nanotribological properties. • Macroscopic coefficient of friction follows the findings on the nanoscale. • The correct growth process for the lubricant layers is crucial for applications. Tribological properties of a surface are controlled by its topography and chemical structure as suggested by theoretical studies. However, the effect of crystallographic orientation on the tribological properties is still controversial. By tuning the heating rate during sulfurization of CVD Mo films, we prepared the few-layer MoS2 films with similar surface topography but different crystallographic c-axis orientation. This resulted in distinctly different tribological behavior both on the nanoscale and macroscale that can be attributed to different surface chemistry and surface electronic and phonon structures. In particular, horizontally aligned MoS2 sheets with c-axis oriented along the surface normal favor the weak van der Waals forces which resulted in a twice lower coefficient of friction comparing to the vertically aligned MoS2 sheets. These results demonstrate the possibility to optimize tribological properties by crystallographic orientation as required for the thin solid-state lubricating layers for extreme conditions.
Availability note (English)
Available from http://dx.doi.org/10.1016/j.apsusc.2020.148328Additional details
Identifiers
- DOI
- 10.1016/j.apsusc.2020.148328;
- PII
- S0169433220330853;
Publishing Information
- Journal Title
- Applied Surface Science
- Journal Volume
- 540
- Journal Page Range
- vp.
- ISSN
- 0169-4332
- CODEN
- ASUSEE
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 54078020
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTALLOGRAPHY; FRICTION; HEATING RATE; MOLYBDENUM SULFIDES; ORIENTATION; THIN FILMS; VAN DER WAALS FORCES
- Descriptors DEC
- CHALCOGENIDES; CHEMICAL COATING; DEPOSITION; FILMS; MOLYBDENUM COMPOUNDS; REFRACTORY METAL COMPOUNDS; SULFIDES; SULFUR COMPOUNDS; SURFACE COATING; TRANSITION ELEMENT COMPOUNDS
Optional Information
- Copyright
- Copyright (c) 2020 Elsevier B.V. All rights reserved.