Published September 1, 2008 | Version v1
Journal article

Ultrathin epitaxially grown bismuth (111) membranes

  • 1. Fachbereich Physik, Universitaet Duisburg-Essen, Lotharstrasse 1, 47057 Duisburg (Germany)
  • 2. Center for Nanointegration (CeNIDE), Universitaet Duisburg-Essen, Lotharstrasse 1, 47057 Duisburg (Germany)

Description

An ex situ cleaning and etching technique was applied to NaCl single crystals to prepare atomically flat and clean NaCl surfaces. These were used as substrates for molecular beam epitaxial growth of ultrathin continuous Bi(111) films. The high film quality - as studied with low energy electron diffraction, atomic force microscopy, and transmission electron diffraction - is attributed to the commensurate 10:7 ratio of the lattice constants. Dissolving the NaCl substrates in water allows the fabrication of freestanding 20 nm thin Bi(111) membranes of centimeter size

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
93
Journal Issue
9
Journal Page Range
p. 093102-093102.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2008 American Institute of Physics