Published July 1991
| Version v1
Journal article
Electrochemical characterization and corrosion behaviour of Ni3Al (0.1B) modified by ion beam techniques: a comparative study
Creators
- 1. Ion Beam Lab., Shanghai Inst. of Metallurgy, Academia Sinica (China)
- 2. Dept. of Materials Science and Processing, Osaka Univ. (Japan)
- 3. Dept. of Physics, Beijing Univ. (China)
- 4. Max-Planck-Inst. fuer Kernphysik, Heidelberg (Germany)
- 5. Physikalisch-Chemisches Inst., Univ. Heidelberg (Germany)
Description
The corrosion behaviour of Ni3Al(0.1B) treated with different ion beam techniques has been characterized by multisweep cyclic voltammetry and optical microscopy. The results revealed that ion implantation, ion beam mixing and ion beam assisted deposition are very effective to reduce the corrosion and improve the passivation behaviour of specimens in a solution of 1N sulphuric acid. (orig.)
Additional details
Publishing Information
- Journal Title
- Nuclear Instruments and Methods in Physics Research, Section B
- Journal Volume
- 59/60
- Journal Issue
- pt.2
- Series
- Nucl. Instrum. Methods Phys. Res., Sect. B.
- Journal Page Range
- 851-854
- ISSN
- 0168-583X
- CODEN
- NIMBE
Conference
- Title
- 7. international conference on ion beam modification of materials (IBMM-7) and exposition.
- Dates
- 9-14 Sep 1990.
- Place
- Knoxville, TN (United States).
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 23007049
- Subject category
- S36: MATERIALS SCIENCE; S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- ALUMINIUM ALLOYS; CORROSION; DEPOSITION; ELECTROCHEMISTRY; FILMS; INTERMETALLIC COMPOUNDS; ION IMPLANTATION; KEV RANGE 100-1000; MAGNESIUM IONS; MIXING; NICKEL ALLOYS; OPTICAL MICROSCOPY; PASSIVATION; SPUTTERING; SULFURIC ACID; VOLTAMETRY
- Descriptors DEC
- ALLOYS; CHARGED PARTICLES; CHEMICAL REACTIONS; ENERGY RANGE; HYDROGEN COMPOUNDS; INORGANIC ACIDS; INORGANIC COMPOUNDS; IONS; KEV RANGE; MICROSCOPY; OXYGEN COMPOUNDS; SULFUR COMPOUNDS