Published July 1, 2018 | Version v1
Journal article

The possibility of using permanent magnets in planar magnetron installations for sputtering magnetic targets

  • 1. St. Petersburg Electrotechnical Univeristy (ETU), 197376, Saint Petersburg (Russian Federation)

Description

The paper includes the results of numerical modeling of the spatial distribution of the magnetic field strength of a magnetron discharge. Special attention is paid to the case where the cathode-target is made of a magnetic material. The paper shows that it is possible to obtain the required value of magnetic field induction above the target surface from a magnetic material either at a target thickness of less than 2 mm or by using a heat removal constraint from the target surface. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1757-899X/387/1/012022

Additional details

Publishing Information

Journal Title
IOP Conference Series. Materials Science and Engineering (Online)
Journal Volume
387
Journal Issue
1
Journal Page Range
[6 p.]
ISSN
1757-899X

Conference

Title
25. International Conference on Vacuum Technique and Technology
Dates
5-7 Jun 2018
Place
St. Petersburg (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
52091945
Subject category
S36: MATERIALS SCIENCE; S42: ENGINEERING;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CATHODES; COMPUTERIZED SIMULATION; INSTALLATION; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETRONS; PERMANENT MAGNETS; SPATIAL DISTRIBUTION; THICKNESS
Descriptors DEC
DIMENSIONS; DISTRIBUTION; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MAGNETS; MATERIALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SIMULATION