Published July 1, 2018
| Version v1
Journal article
The possibility of using permanent magnets in planar magnetron installations for sputtering magnetic targets
Creators
- 1. St. Petersburg Electrotechnical Univeristy (ETU), 197376, Saint Petersburg (Russian Federation)
Description
The paper includes the results of numerical modeling of the spatial distribution of the magnetic field strength of a magnetron discharge. Special attention is paid to the case where the cathode-target is made of a magnetic material. The paper shows that it is possible to obtain the required value of magnetic field induction above the target surface from a magnetic material either at a target thickness of less than 2 mm or by using a heat removal constraint from the target surface. (paper)
Availability note (English)
Available from http://dx.doi.org/10.1088/1757-899X/387/1/012022Additional details
Identifiers
Publishing Information
- Journal Title
- IOP Conference Series. Materials Science and Engineering (Online)
- Journal Volume
- 387
- Journal Issue
- 1
- Journal Page Range
- [6 p.]
- ISSN
- 1757-899X
Conference
- Title
- 25. International Conference on Vacuum Technique and Technology
- Dates
- 5-7 Jun 2018
- Place
- St. Petersburg (Russian Federation)
INIS
- Country of Publication
- United Kingdom
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 52091945
- Subject category
- S36: MATERIALS SCIENCE; S42: ENGINEERING;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CATHODES; COMPUTERIZED SIMULATION; INSTALLATION; MAGNETIC FIELDS; MAGNETIC MATERIALS; MAGNETRONS; PERMANENT MAGNETS; SPATIAL DISTRIBUTION; THICKNESS
- Descriptors DEC
- DIMENSIONS; DISTRIBUTION; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; MAGNETS; MATERIALS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; SIMULATION