Multi-arc ion plating and DC magnetron sputtering integrated technique for high-performance Al,C-co-doped δ-TiN quaternary films

Highlights: • TiAlCN quaternary films were fabricated by a novel multi-arc ion plating and DC magnetron sputtering (MIP&DCMS) integrated technique. • TiAlCN quaternary films presented fine grains, high compactness and heterophase composite structures. • Characteristic microstructure of the TiAlCN films contributed to it's superior mechanical, tribological and anticorrosive performances. • Improved corrosion durability of the TiAlCN films was attributed to it's high barrier nature during long periods of immersion in 3.5 wt.% NaCl solution. A new approach was adopted to integrate the promising performances of TiAlN and TiCN ternary films for applications in extreme environments. In this study, Al,C-co-doped δ-TiN films, that is, TiAlCN quaternary films, were fabricated using a novel multi-arc ion plating and direct current (DC) magnetron sputtering (MIP&DCMS) integrated technique. The sandwich-like gradient architecture of the TiAlCN quaternary films altered the columnar crystal nature of the δ-TiN matrix and yielded fine grains, finally producing a heterophase composite structure. This structure contributed to its high microhardness (36.8 ± 1.6 GPa) and elastic modulus (410 ± 22 GPa) while maintaining superior tribological characteristics, with a friction coefficient of 0.26 ± 0.03. The TiAlCN quaternary films provided excellent corrosion resistance to SS304 with a corrosion current density of 0.129 ± 0.116 μA cm⁻² and a polarization resistance of 430.5 ± 10.56 kΩ cm², which are comparable to those of emerging TiAlN and TiCN ternary films.