Published February 16, 2009 | Version v1
Journal article

Impacts of anisotropic lattice relaxation on crystal mosaicity and luminescence spectra of m-plane AlxGa1-xN films grown on m-plane freestanding GaN substrates by NH3 source molecular beam epitaxy

  • 1. CANTech, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577 (Japan)
  • 2. Optoelectronics Laboratory, Mitsubishi Chemical Corporation, 1000 Higashi-Mamiana, Ushiku 300-1295 (Japan)
  • 3. Mitsubishi Chemical Group Science and Technology Research Center, Inc., 8-3-1 Chuo, Ami, Inashiki 300-0332 (Japan)

Description

In-plane anisotropic lattice relaxation was correlated with the crystal mosaicity and luminescence spectra for m-plane AlxGa1-xN films grown on a freestanding GaN substrate by NH3-source molecular beam epitaxy. The homoepitaxial GaN film exhibited A- and B-excitonic emissions at 8 K, which obeyed the polarization selection rules. For AlxGa1-xN overlayers, the m-plane tilt mosaic along c-axis was the same as the substrate as far as coherent growth was maintained (x≤0.25). However, it became more severe than along the a-axis for lattice-relaxed films (x≥0.52). The results are explained in terms of anisotropic lattice and thermal mismatches between the film and the substrate. Nonetheless, all the AlxGa1-xN films exhibited a near-band-edge emission peak and considerably weak deep emission at room temperature

Additional details

Identifiers

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
94
Journal Issue
7
Journal Page Range
p. 071910-071910.3
ISSN
0003-6951
CODEN
APPLAB

Optional Information

Notes
(c) 2009 American Institute of Physics