Impacts of anisotropic lattice relaxation on crystal mosaicity and luminescence spectra of m-plane AlxGa1-xN films grown on m-plane freestanding GaN substrates by NH3 source molecular beam epitaxy
Creators
- 1. CANTech, Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba, Sendai 980-8577 (Japan)
- 2. Optoelectronics Laboratory, Mitsubishi Chemical Corporation, 1000 Higashi-Mamiana, Ushiku 300-1295 (Japan)
- 3. Mitsubishi Chemical Group Science and Technology Research Center, Inc., 8-3-1 Chuo, Ami, Inashiki 300-0332 (Japan)
Description
In-plane anisotropic lattice relaxation was correlated with the crystal mosaicity and luminescence spectra for m-plane AlxGa1-xN films grown on a freestanding GaN substrate by NH3-source molecular beam epitaxy. The homoepitaxial GaN film exhibited A- and B-excitonic emissions at 8 K, which obeyed the polarization selection rules. For AlxGa1-xN overlayers, the m-plane tilt mosaic along c-axis was the same as the substrate as far as coherent growth was maintained (x≤0.25). However, it became more severe than along the a-axis for lattice-relaxed films (x≥0.52). The results are explained in terms of anisotropic lattice and thermal mismatches between the film and the substrate. Nonetheless, all the AlxGa1-xN films exhibited a near-band-edge emission peak and considerably weak deep emission at room temperature
Additional details
Identifiers
- DOI
- 10.1063/1.3089248;
Publishing Information
- Journal Title
- Applied Physics Letters
- Journal Volume
- 94
- Journal Issue
- 7
- Journal Page Range
- p. 071910-071910.3
- ISSN
- 0003-6951
- CODEN
- APPLAB
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 40051351
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Descriptors DEI
- ALUMINIUM NITRIDES; AMMONIA; ANISOTROPY; CRYSTAL GROWTH; CRYSTALS; FILMS; GALLIUM NITRIDES; LAYERS; LUMINESCENCE; MOLECULAR BEAM EPITAXY; POLARIZATION; SELECTION RULES; SEMICONDUCTOR MATERIALS; SUBSTRATES; TEMPERATURE RANGE 0273-0400 K
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CRYSTAL GROWTH METHODS; EMISSION; EPITAXY; GALLIUM COMPOUNDS; HYDRIDES; HYDROGEN COMPOUNDS; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; NITROGEN HYDRIDES; PHOTON EMISSION; PNICTIDES; TEMPERATURE RANGE
Optional Information
- Notes
- (c) 2009 American Institute of Physics