Studies on the sythesis of c-BN layers with ECWR-PACVD and borane- ammonia as educt material

Boron nitride films were deposited by controlled plasma assisted chemical vapor deposition (PACVD) on the basis of borane-ammonia (BH3NH3) as B- and N- supplier. Having a high vapor pressure, this white crystalline solid of less toxicity in comparision to generally used boron precursors can easily be transferred into the gas phase by moderate heating. Together with argon as working gas the BH3NH3-vapor is led into a two-circuit plasma source utilizing the electron cyclotron wave resonance technique (ECWR) for ionization and dissoziation of the gas mixture by electron impact in the low pressure range (∝10 mbar). For a precise adjustment of the energy of the ionic plasma species arriving at the growing film, an r.f.-diode circuit is superimposed to the discharge. Since for a controlled film deposition by PACVD a stationary plasma composition is mandatory, the evaporation characteristics of the reactant source was determined primarily. Therefore the evolution of the plasma and the vapor composition in dependence of evaporation time and temperature was investigated by optical emission spectroscopy (OES) and by mass spectrometric measurements respectively. By these investigations it was shown that stationary plasma conditions are established in a temperature range of 120-160 C. This behavior can be explained by a change in the chemical composition of the reactant during the evaporation process