Towards a utilisation of transient processing in the technology of high efficiency silicon solar cells

The utilization of transient processing in the technology of high efficient silicon solar cells is investigated. An ultraviolet laser (an ArF pulsed excimer laser working at 193 nm) is applied. Laser processing induces only a short superficial melting of the material and does not modify the transport properties in the base of the material. This mode of processing associated to ion implantation to form the junction as well as an oxide layer in an atmosphere of oxygen. The volume was left entirely cold in this process. The results of the investigation show: that an entirely cold process of solar cell fabrication needs a thermal treatment at a temperature around 600 C; that the oxides obtained are not satisfying as passivating layers; and that the Rapid Thermal Processing (RTP) induced recombination centers are not directly related to the quenching step but a consequence of the presence of metal impurities. The utilisation of transient processing in the adiabatic regime (laser) and in the rapid isothermal regime (RTP) are possible as two complementary techniques for the realization of high efficiency solar cells