Published December 3, 1985 | Version v1
Patent

Multi-function charged particle apparatus

Description

An apparatus capable of simultaneous focusing, positioning, and scanning of an ion beam is described. The apparatus uses metallic elements to form the sides of an open-ended substantially box-shaped structure. Application of AC and DC currents to the four corners of the structure create AC and DC fields within the structure that deflect an ion beam so as to perform the functions of positioning, focusing, and scanning. The center of focusing of the ion beam is placed closer to the center of scanning of the ion beam than in conventional ion beam deflection systems. As a result, the tendency of space charge beam blow-up during scanning is greatly diminished. By combining the functions of positioning, focusing, and scanning in one deflection element, the length of an ion beam deflection system is reduced, and the current capability is greatly increased

Availability note (English)

U.S. Commissioner of Patents, Washington, D.C. 20231, USA, $.50.

Additional details

Publishing Information

Imprint Pagination
vp.
IPC:
Int. Cl. H01J 7/24.
IPC
Int. Cl. H01J 7/24.
Patent number
US patent document 4,556,823/A/

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
19023200
Subject category
S43: PARTICLE ACCELERATORS;
Resource subtype / Literary indicator
Non-conventional Literature
Descriptors DEI
ACCELERATORS; BEAM FOCUSING MAGNETS; BEAM MONITORING; BEAM POSITION; BEAM SCANNERS; BEAM TRANSPORT; FOCUSING; ION BEAM TARGETS; ION BEAMS; ION SOURCES; PERFORMANCE; QUADRUPOLES; SPACE CHARGE; SPECIFICATIONS
Descriptors DEC
BEAM MONITORS; BEAMS; EQUIPMENT; MAGNETS; MEASURING INSTRUMENTS; MONITORING; MONITORS; MULTIPOLES; TARGETS

Optional Information

Notes
PAT-APPL-518229.