Published November 2005 | Version v1
Journal article

The growth of Zn on a Si(1 0 0)-2x1 surface

  • 1. Advanced Science Research Laboratory, Saitama Institute of Technology, 1690 Fusaiji, Okabe, Saitama (Japan) and State Key Laboratory for Physical Chemistry of Solid Surfaces, Xiamen University, Xiamen 361005 (China)
  • 2. Advanced Science Research Laboratory, Saitama Institute of Technology, 1690 Fusaiji, Okabe, Saitama (Japan)

Description

Adsorption of Zn atoms on a Si(1 0 0)-2x1 surface was studied by scanning tunneling microscopy at room temperature. Narrow lines are grown perpendicular to the Si-dimer rows of the [1 1 0] direction at low coverage. The narrow line is formed by arraying rectangular Zn3 dots, where a dot is composed of one Zn atom on a Si dimer and the other two in the neighboring two hollow sites. When the Si(1 0 0)-2x1 surface is covered with one monolayer of Zn, a 4x1 structure is established. More deposition of Zn on the 4x1 monolayer grows into three-dimensional Zn islands

Additional details

Identifiers

DOI
10.1016/j.ultramic.2005.06.010;
PII
S0304-3991(05)00113-0;

Publishing Information

Journal Title
Ultramicroscopy (Amsterdam)
Journal Volume
105
Journal Issue
1-4
Journal Page Range
p. 6-11
ISSN
0304-3991
CODEN
ULTRD6

Conference

Title
6. international conference on scanning probe microscopy, sensors and nanostructures
Acronym
SPM 2004
Dates
24-26 May 2004
Place
Beijing (China)

INIS

Country of Publication
Netherlands
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
37043107
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference
Descriptors DEI
ADSORPTION; ATOMS; DIMERS; SCANNING TUNNELING MICROSCOPY; SURFACE COATING; SURFACES; TEMPERATURE RANGE 0273-0400 K; ZINC
Descriptors DEC
DEPOSITION; ELEMENTS; METALS; MICROSCOPY; SORPTION; TEMPERATURE RANGE

Optional Information

Copyright
Copyright (c) 2005 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.