Published December 2021 | Version v1
Journal article

Indexation of electron diffraction patterns at grain boundaries

  • 1. SJTU-Paris Elite Institute of Technology, Shanghai Jiao Tong University, Shanghai 200240 (China)
  • 2. School of Materials Science and Engineering, Shanghai Jiao Tong University, Shanghai 200240 (China)
  • 3. EdF R&D, Site des Renardières, avenue des Renardières, Ecuelles, F-77818 Moret-sur-Loing (France)
  • 4. Université Paris-Saclay, ENS Paris-Saclay, CNRS, LMT - Laboratoire de Mécanique et Technologie, F-91190 Gif-sur-Yvette (France)

Description

Grain boundaries play a vital role in materials science, and they are extensively studied through experimental and numerical methods. Electron backscatter diffraction (EBSD) is commonly used to characterize crystalline materials, yet its performance is often compromised at grain boundaries. The key difficulty is to index the overlapped electron backscatter patterns, where Kikuchi bands from multiple crystal orientations coexist. Hough-indexation often fails in treating overlapped EBSP, while the recently proposed dictionary indexation and sphere indexation give only one triplet of Euler angles from overlapped patterns. For all these methods, the orientation indexing precision drops for overlapped EBSP. Here we propose an integrated Digital Image Correlation (DIC) procedure to determine simultaneously and precisely multiple crystal orientations by registering the overlapped EBSP and the master pattern. The contribution ratio of each crystal orientation to the overlapped pattern is also available. Through an experimental EBSD dataset around a triple point, multiple benefits of the rich results from the method are demonstrated, such as refining grain boundaries, revealing EBSD scan errors and quantifying spatial resolution of EBSD. At the grain boundaries, the crystal orientation measurement uncertainty is 0.03 for both indexed crystal orientations, the same order for grain interiors, while their contribution ratios of uncertainty around 0.02 are obtained.

Availability note (English)

Available from http://dx.doi.org/10.1016/j.matchar.2021.111553

Additional details

Identifiers

DOI
10.1016/j.matchar.2021.111553;
PII
S1044580321006756;

Publishing Information

Journal Title
Materials Characterization
Journal Volume
182
Journal Page Range
vp.
ISSN
1044-5803
CODEN
MACHEX

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
54034026
Subject category
S36: MATERIALS SCIENCE; S74: ATOMIC AND MOLECULAR PHYSICS;
Descriptors DEI
BACKSCATTERING; CRYSTALS; ELECTRON DIFFRACTION; ELECTRONS; ERRORS; GRAIN BOUNDARIES; MATERIALS; PERFORMANCE; REFINING; SPATIAL RESOLUTION; TRIPLETS
Descriptors DEC
COHERENT SCATTERING; DIFFRACTION; ELEMENTARY PARTICLES; FERMIONS; LEPTONS; MICROSTRUCTURE; MULTIPLETS; PROCESSING; RESOLUTION; SCATTERING

Optional Information

Copyright
Copyright (c) 2021 Published by Elsevier Inc.