Published May 26, 2017 | Version v1
Journal article

Thickness-dependent Dirac dispersions of few-layer topological insulators supported by metal substrate

  • 1. Department of Physics, Korea University, 145 Anam-ro, Seongbuk-gu, Seoul, 02841 (Korea, Republic of)
  • 2. Department of Emerging Materials Science, DGIST, 333 Techno-Jungang-daero, Hyeonpung-Myun, Dalseong-Gun, Daegu, 42988 (Korea, Republic of)

Description

The surface states protected by time-reversal symmetry in 3-dimensional topological insulators have recently been confirmed by angle-resolved photoemission spectroscopy, scanning tunneling microscopy, quantum transport and so on. However, the electronic properties of ultra-thin topological insulator films have not been extensively studied, especially when the films are grown on metal substrates. In this paper, we have elucidated the local behaviors of the electronic states of ultra-thin topological insulator Bi2Se3 grown with molecular beam epitaxy on Au(111) using scanning tunneling microscopy/spectroscopy. We have observed linear dispersion of electron interference patterns at higher energies than the Fermi energy that were not accessible by conventional angle-resolved photoemission spectroscopy. Moreover, the dispersion of the interference patterns varies with the film thickness, which is explained by band bending near the interface between the topological insulator and the metal substrate. Our experiments demonstrate that interfacial effects in thin topological insulator films on metal substrate can be sensed using scanning tunneling spectroscopy. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1361-6528/aa6b52

Additional details

Identifiers

Publishing Information

Journal Title
Nanotechnology (Print)
Journal Volume
28
Journal Issue
21
Journal Page Range
[6 p.]
ISSN
0957-4484