Applications of Nuclear Analytical Methods for High Tech Industry
Description
Silicon based semiconductor chip manufacturing is a worldwide high technology industry with numerous measurement issues. One of the major concerns in the semiconductor manufacturing is contamination such as the trace metal impurities. This concern is vividly illustrated by the fact that the manufacturing in this industry is done in ultra clean environment where the entire manufacturing facility or "Fab" is a clean room facility or each and every manufacturing tool is enclosed in a mini-environment Although semiconductor devices are fabricated on the surface of the Si wafers contamination in the bulk material is a major concern. Nuclear methods of analysis are uniquely suited for the contamination analysis in such a matrix. Many opportunities in the semiconductor manufacturing field exist for the nuclear methods to provide support services. Contamination analysis by NAA, depth profiles by NDP and prompt gamma analysis of H in thin films are a few examples. These needs are on-going and require commitment from the lab so that a manufacturing operation can rely on the delivery of these services when required
Availability note (English)
Available on-line: http://www-pub.iaea.org/MTCD/Publications/PDF/SupplementaryMaterials/TECDOC_1713_CD/template-cd/datasets/papers/Hossain%20Applications%20of%20Nuclear%20Analytical%20Methods%20for%20High%20Tech%20Industry.pdfAdditional details
Identifiers
- URL
- http://www-pub.iaea.org/MTCD/Publications/PDF/SupplementaryMaterials/TECDOC_1713_CD/template-cd/datasets/papers/Hossain%20Applications%20of%20Nuclear%20Analytical%20Methods%20for%20High%20Tech%20Industry.pdf; http://www-pub.iaea.org/MTCD/Publications/PDF/SupplementaryMaterials/TECDOC_1713_CD/template-cd/datasets/foreword.html; http://www.iaea.org/books;
Publishing Information
- ISBN
- 978-92-0-143610-8
- Imprint Title
- Commercial products and services of research reactors. Proceedings of a technical meeting
- Imprint Pagination
- [1 CD-ROM]
- Journal Page Range
- 5 p.
- ISSN
- 1011-4289
- Report number
- IAEA-TECDOC--1715(Companion CD)
Conference
- Title
- Technical meeting on commercial products and services of research reactors
- Dates
- 28 Jun - 2 Jul 2010
- Place
- Vienna (Austria)
INIS
- Country of Publication
- International Atomic Energy Agency (IAEA)
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 44086829
- Subject category
- S36: MATERIALS SCIENCE;
- Resource subtype / Literary indicator
- Conference, Non-conventional Literature
- Descriptors DEI
- CONTAMINATION; IMPURITIES; NEUTRON ACTIVATION ANALYSIS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SILICON; THIN FILMS
- Descriptors DEC
- ACTIVATION ANALYSIS; CHEMICAL ANALYSIS; ELEMENTS; FILMS; MATERIALS; NONDESTRUCTIVE ANALYSIS; SEMIMETALS
Optional Information
- Notes
- 1 tab.
- Secondary number(s)
- IAEA-TM--26430 (2004)