Published July 2013 | Version v1
Report

Applications of Nuclear Analytical Methods for High Tech Industry

Creators

  • 1. AMD, Inc., Austin, TX (United States)

Description

Silicon based semiconductor chip manufacturing is a worldwide high technology industry with numerous measurement issues. One of the major concerns in the semiconductor manufacturing is contamination such as the trace metal impurities. This concern is vividly illustrated by the fact that the manufacturing in this industry is done in ultra clean environment where the entire manufacturing facility or "Fab" is a clean room facility or each and every manufacturing tool is enclosed in a mini-environment Although semiconductor devices are fabricated on the surface of the Si wafers contamination in the bulk material is a major concern. Nuclear methods of analysis are uniquely suited for the contamination analysis in such a matrix. Many opportunities in the semiconductor manufacturing field exist for the nuclear methods to provide support services. Contamination analysis by NAA, depth profiles by NDP and prompt gamma analysis of H in thin films are a few examples. These needs are on-going and require commitment from the lab so that a manufacturing operation can rely on the delivery of these services when required

Availability note (English)

Available on-line: http://www-pub.iaea.org/MTCD/Publications/PDF/SupplementaryMaterials/TECDOC_1713_CD/template-cd/datasets/papers/Hossain%20Applications%20of%20Nuclear%20Analytical%20Methods%20for%20High%20Tech%20Industry.pdf
Part of:
Commercial products and services of research reactors. Proceedings of a technical meeting

Additional details

Publishing Information

ISBN
978-92-0-143610-8
Imprint Title
Commercial products and services of research reactors. Proceedings of a technical meeting
Imprint Pagination
[1 CD-ROM]
Journal Page Range
5 p.
ISSN
1011-4289
Report number
IAEA-TECDOC--1715(Companion CD)

Conference

Title
Technical meeting on commercial products and services of research reactors
Dates
28 Jun - 2 Jul 2010
Place
Vienna (Austria)

INIS

Country of Publication
International Atomic Energy Agency (IAEA)
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44086829
Subject category
S36: MATERIALS SCIENCE;
Resource subtype / Literary indicator
Conference, Non-conventional Literature
Descriptors DEI
CONTAMINATION; IMPURITIES; NEUTRON ACTIVATION ANALYSIS; SEMICONDUCTOR DEVICES; SEMICONDUCTOR MATERIALS; SILICON; THIN FILMS
Descriptors DEC
ACTIVATION ANALYSIS; CHEMICAL ANALYSIS; ELEMENTS; FILMS; MATERIALS; NONDESTRUCTIVE ANALYSIS; SEMIMETALS

Optional Information

Notes
1 tab.
Secondary number(s)
IAEA-TM--26430 (2004)