Published November 1, 2019 | Version v1
Journal article

The role of the semiconductor layer in the exchange-bias film structure of CoNi / Si / FeNi / Si with a spin spring effect

  • 1. Siberian Federal University, prospect Svobodny, 79, Krasnoyarsk, 660041 (Russian Federation)
  • 2. L.V. Kirensky Institute of Physics of Siberian Branch of Russian Academy of Sciences, Krasnoyarsk, 660036 (Russian Federation)

Description

CoNi / Si / FeNi / Si structures were synthesized by ion-plasma sputtering. A negative hysteresis loop bias was detected at the thickness of the silicon layer was less than 2 nm and the temperature was less than 100 K. A positive hysteresis loop bias was detected at the thickness of the silicon layer was more than 2 nm and the temperature greater than 100K. (paper)

Availability note (English)

Available from http://dx.doi.org/10.1088/1742-6596/1389/1/012028

Additional details

Publishing Information

Journal Title
Journal of Physics. Conference Series (Online)
Journal Volume
1389
Journal Issue
1
Journal Page Range
[5 p.]
ISSN
1742-6596

Conference

Title
7. Euro-Asian Symposium Trends in Magnetism
Dates
8-13 Sep 2019
Place
Ekaterinburg (Russian Federation)

INIS

Country of Publication
United Kingdom
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
53062783
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
IONS; LAYERS; PLASMA; SEMICONDUCTOR MATERIALS; SILICON; SPIN; THICKNESS; THIN FILMS
Descriptors DEC
ANGULAR MOMENTUM; CHARGED PARTICLES; DIMENSIONS; ELEMENTS; FILMS; MATERIALS; PARTICLE PROPERTIES; SEMIMETALS