Published August 31, 2000
| Version v1
Report
Atomic Force Microscopy Study of High Electric Field Breakdown Through Thin Oxide Layers on Copper
Description
no abstract available
Availability note (English)
Available from PURL: https://www.osti.gov/servlets/purl/764996-YGR6LY/native/Additional details
Identifiers
Publishing Information
- Imprint Pagination
- 19 p.
- Report number
- SLAC-PUB--8600
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 32032719
- Subject category
- S36: MATERIALS SCIENCE; S43: PARTICLE ACCELERATORS;
- Resource subtype / Literary indicator
- No Abstract, Non-conventional Literature
- Descriptors DEI
- ATOMIC FORCE MICROSCOPY; BREAKDOWN; COPPER; COPPER OXIDES; ELECTRIC FIELDS; LINEAR ACCELERATORS
- Descriptors DEC
- ACCELERATORS; CHALCOGENIDES; COPPER COMPOUNDS; ELEMENTS; METALS; MICROSCOPY; OXIDES; OXYGEN COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; TRANSITION ELEMENTS
Optional Information
- Contract/Grant/Project number
- AC03-76SF00515
- Notes
- This record replaces 31057332
- Funding organization
- USDOE Office of Energy Research (ER) (United States)