Published April 1980 | Version v1
Journal article

Kinetics and mechanism of pickling of metal films of vanadium and chromium subgroup in halogen-containing high-frequency discharge

Description

The mechanism and kinetics of pickling of metal films of vanadium and chromium subgroup in halogen-containing discharge are considered. It has been found out that for metals of chromium subgroup oxygen additions increase their pickling rate both in chlorine and fluorine-containing discharge. On the contrary, for metals of vanadium subgroup the increase of pickling rate with oxygen additions is observed only in fluorine-containing discharge, in chlorine-containing discharge the rate of the process decreases

Additional details

Additional titles

Original title (Russian)
Кинетика и механизм травления пленок металлов подгруппы ванадия и хрома в галогенсодержащем высокочастотном разряде

Publishing Information

Journal Title
Zh. Fiz. Khim.
Journal Volume
54
Journal Issue
4
Series
Zh. Fiz. Khim.
Journal Page Range
940-942
ISSN
0044-4537

Optional Information

Notes
For English translation see the journal Russian Journal of Physical Chemistry (UK).