Published April 1980
| Version v1
Journal article
Kinetics and mechanism of pickling of metal films of vanadium and chromium subgroup in halogen-containing high-frequency discharge
Creators
Description
The mechanism and kinetics of pickling of metal films of vanadium and chromium subgroup in halogen-containing discharge are considered. It has been found out that for metals of chromium subgroup oxygen additions increase their pickling rate both in chlorine and fluorine-containing discharge. On the contrary, for metals of vanadium subgroup the increase of pickling rate with oxygen additions is observed only in fluorine-containing discharge, in chlorine-containing discharge the rate of the process decreases
Additional details
Additional titles
- Original title (Russian)
- Кинетика и механизм травления пленок металлов подгруппы ванадия и хрома в галогенсодержащем высокочастотном разряде
Publishing Information
- Journal Title
- Zh. Fiz. Khim.
- Journal Volume
- 54
- Journal Issue
- 4
- Series
- Zh. Fiz. Khim.
- Journal Page Range
- 940-942
- ISSN
- 0044-4537
INIS
- Country of Publication
- Russian Federation
- Country of Input or Organization
- USSR
- INIS RN
- 12584100
- Subject category
- S37: INORGANIC, ORGANIC, PHYSICAL AND ANALYTICAL CHEMISTRY;
- Descriptors DEI
- CHEMICAL REACTION KINETICS; ELECTRIC DISCHARGES; FILMS; MOLYBDENUM; NIOBIUM; ORGANIC CHLORINE COMPOUNDS; ORGANIC FLUORINE COMPOUNDS; OXYGEN; PICKLING; TANTALUM; TUNGSTEN; VANADIUM
- Descriptors DEC
- ELEMENTS; KINETICS; METALS; NONMETALS; ORGANIC COMPOUNDS; ORGANIC HALOGEN COMPOUNDS; REACTION KINETICS; SURFACE TREATMENTS; TRANSITION ELEMENTS
Optional Information
- Notes
- For English translation see the journal Russian Journal of Physical Chemistry (UK).