Published August 1, 2001
| Version v1
Journal article
Substrate cooling efficiency during cryogenic inductively coupled plasma polymer etching for diffractive optics on membranes
Description
no abstract available
Additional details
Publishing Information
- Journal Title
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
- Journal Volume
- 19
- Journal Issue
- 6
- Journal Page Range
- [10 p.]
- ISSN
- 0734-211X
- CODEN
- JVTBD9
INIS
- Country of Publication
- United States
- Country of Input or Organization
- United States
- INIS RN
- 33063891
- Subject category
- S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
- Resource subtype / Literary indicator
- No Abstract
- Descriptors DEI
- CRYOGENICS; DIFFRACTION; DIFFRACTION GRATINGS; EFFICIENCY; ETCHING; MEMBRANES; PLASMA; POLYMERS; SUBSTRATES
- Descriptors DEC
- COHERENT SCATTERING; SCATTERING; SURFACE FINISHING
Optional Information
- Contract/Grant/Project number
- AC03-76SF00098
- Notes
- Journal Publication Date: Nov/Dec. 2001
- Funding organization
- USDOE Director, Office of Science. Office of Basic Energy Studies. Division of Materials Sciences (United States)
- Secondary number(s)
- LBNL--48780