An investigation of the tungsten silicide formed by As ion beam mixing with Rutherford backscattering

The conditions of forming tungsten silicide with As ion beam mixing have been studied by means of Rutherford backscattering. The comparison between sintering and ion beam mixing has been performed. The phases have been also identified by X-ray diffraction. The results demonstrated that the refractory metal silicide may be formed at a reduced reaction temperature using ion beam mixing technique. The effect of oxygen impurity on silicide formation has been observed. Finally, the mechanism on the formation of the silicide by ion beam mixing is simply discussed