Nanowelding and patterning of silver nanowires via mask-free atmospheric cold plasma-jet scanning

Silver nanowire (AgNW) thin film is a promising candidate to replace traditional indium tin oxide in optoelectronics applications. To date however, the widespread application of AgNW thin film is limited by the weak point contacts between individual AgNWs and the lack of facile patterning techniques. Here, we demonstrate a novel and facile method to not only nanoweld AgNW junctions but also pattern AgNW thin films via mask-free cold plasma-jet scanning in ambient conditions. After the plasma-jet nanowelding treatment, the morphology of AgNWs change substantially and the junctions are welded together. The nanowelded AgNWs-based thin film shows enhanced electrical and mechanical properties. On the other hand, after the plasma-jet patterning treatment, the AgNWs are etched and transformed into separated large particles. Different kinds of patterns are produced via this patterning technique. At last, a simple light emitting diode circuit is fabricated to demonstrate the suitability of the nanowelded and patterned AgNW electrodes for flexible electronic devices. (paper)