Published October 1, 1981 | Version v1
Journal article

Aspects of the physics, chemistry, and technology of high intensity heavy ion sources

Creators

  • 1. Oak Ridge National Lab., TN (USA)

Description

Particular emphasis is placed on the technology of plasma discharge ion scources which utilize solid elemental or molecular compounds to produce vapor for the ionization process. A brief discussion is made of the elementary concepts underlying the formation and extraction of ion beams from plasma discharge sources. A limited review of low charge state positive ion sources suitable for accelerator use is also given. (orig.)

Additional details

Publishing Information

Journal Title
Nucl. Instrum. Methods Phys. Res.
Journal Volume
189
Journal Issue
1
Series
Nucl. Instrum. Methods Phys. Res.
Journal Page Range
15-42
ISSN
0029-554X

Conference

Title
3. international conference on ion implantation equipment and techniques.
Dates
8 - 11 Jul 1980.
Place
Kingston, Canada.

INIS

Country of Publication
Netherlands
Country of Input or Organization
Netherlands
INIS RN
13659423
Subject category
S07: ISOTOPES AND RADIATION SOURCES;
Resource subtype / Literary indicator
Conference, Progress Report
Descriptors DEI
BEAM EXTRACTION; BEAM OPTICS; CATIONS; DUOPLASMATRONS; ELECTRIC ARCS; HOLLOW CATHODES; ION BEAMS; IONIZATION; MAGNETRONS; PENNING ION SOURCES; PLASMA; SPUTTERING
Descriptors DEC
BEAMS; CATHODES; CHARGED PARTICLES; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ION SOURCES; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PLASMATRONS