Published October 1, 1981
| Version v1
Journal article
Aspects of the physics, chemistry, and technology of high intensity heavy ion sources
Description
Particular emphasis is placed on the technology of plasma discharge ion scources which utilize solid elemental or molecular compounds to produce vapor for the ionization process. A brief discussion is made of the elementary concepts underlying the formation and extraction of ion beams from plasma discharge sources. A limited review of low charge state positive ion sources suitable for accelerator use is also given. (orig.)
Additional details
Publishing Information
- Journal Title
- Nucl. Instrum. Methods Phys. Res.
- Journal Volume
- 189
- Journal Issue
- 1
- Series
- Nucl. Instrum. Methods Phys. Res.
- Journal Page Range
- 15-42
- ISSN
- 0029-554X
Conference
- Title
- 3. international conference on ion implantation equipment and techniques.
- Dates
- 8 - 11 Jul 1980.
- Place
- Kingston, Canada.
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- Netherlands
- INIS RN
- 13659423
- Subject category
- S07: ISOTOPES AND RADIATION SOURCES;
- Resource subtype / Literary indicator
- Conference, Progress Report
- Descriptors DEI
- BEAM EXTRACTION; BEAM OPTICS; CATIONS; DUOPLASMATRONS; ELECTRIC ARCS; HOLLOW CATHODES; ION BEAMS; IONIZATION; MAGNETRONS; PENNING ION SOURCES; PLASMA; SPUTTERING
- Descriptors DEC
- BEAMS; CATHODES; CHARGED PARTICLES; CURRENTS; ELECTRIC CURRENTS; ELECTRIC DISCHARGES; ELECTRODES; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ION SOURCES; IONS; MICROWAVE EQUIPMENT; MICROWAVE TUBES; PLASMATRONS