Published October 2004 | Version v1
Journal article

Absolute calibration of vacuum ultraviolet spectrograph system for plasma diagnostics

  • 1. Toyota Technological Institute, Tempaku, Nagoya, Aichi 468-8511 (Japan)
  • 2. National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568 (Japan)
  • 3. Plasma Research Center, University of Tsukuba, Tsukuba, Ibaraki 305-8577 (Japan)

Description

A space- and time-resolving vacuum ultraviolet (VUV) spectrograph system has been applied to diagnose impurity ions behavior in plasmas produced in the tandem mirror GAMMA 10 and the reversed field pinch TPE-RX. We have carried out ray tracing calculations for obtaining the characteristics of the VUV spectrograph and calibration experiments to measure the absolute sensitivities of the VUV spectrograph system for the wavelength range from 100 to 1100 A. By changing the incident angle, 50.6 deg. -51.4 deg., to the spectrograph whose nominal incident angle is 51 deg., we can change the observing spectral range of the VUV spectrograph. In this article, we show the ray tracing calculation results and absolute sensitivities when the angle of incidence into the VUV spectrograph is changed, and the results of VUV spectroscopic measurement in both GAMMA 10 and TPE-RX plasmas

Additional details

Identifiers

Publishing Information

Journal Title
Review of Scientific Instruments
Journal Volume
75
Journal Issue
10
Journal Page Range
p. 4088-4090
ISSN
0034-6748
CODEN
RSINAK

Conference

Title
15. topical conference on high temperature plasma diagnostics
Dates
19-22 Apr 2004
Place
San Diego, CA (United States)

Optional Information

Notes
(c) 2004 American Institute of Physics