Absolute calibration of vacuum ultraviolet spectrograph system for plasma diagnostics
Creators
- 1. Toyota Technological Institute, Tempaku, Nagoya, Aichi 468-8511 (Japan)
- 2. National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568 (Japan)
- 3. Plasma Research Center, University of Tsukuba, Tsukuba, Ibaraki 305-8577 (Japan)
Description
A space- and time-resolving vacuum ultraviolet (VUV) spectrograph system has been applied to diagnose impurity ions behavior in plasmas produced in the tandem mirror GAMMA 10 and the reversed field pinch TPE-RX. We have carried out ray tracing calculations for obtaining the characteristics of the VUV spectrograph and calibration experiments to measure the absolute sensitivities of the VUV spectrograph system for the wavelength range from 100 to 1100 A. By changing the incident angle, 50.6 deg. -51.4 deg., to the spectrograph whose nominal incident angle is 51 deg., we can change the observing spectral range of the VUV spectrograph. In this article, we show the ray tracing calculation results and absolute sensitivities when the angle of incidence into the VUV spectrograph is changed, and the results of VUV spectroscopic measurement in both GAMMA 10 and TPE-RX plasmas
Additional details
Identifiers
- DOI
- 10.1063/1.1789264;
Publishing Information
- Journal Title
- Review of Scientific Instruments
- Journal Volume
- 75
- Journal Issue
- 10
- Journal Page Range
- p. 4088-4090
- ISSN
- 0034-6748
- CODEN
- RSINAK
Conference
- Title
- 15. topical conference on high temperature plasma diagnostics
- Dates
- 19-22 Apr 2004
- Place
- San Diego, CA (United States)
INIS
- Country of Publication
- United States
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 36083202
- Subject category
- S70: PLASMA PHYSICS AND FUSION TECHNOLOGY;
- Resource subtype / Literary indicator
- Conference
- Descriptors DEI
- CALIBRATION; FAR ULTRAVIOLET RADIATION; GAMMA 10 DEVICES; INCIDENCE ANGLE; PLASMA DIAGNOSTICS; PLASMA IMPURITIES; REVERSE-FIELD PINCH; SENSITIVITY; TPE-RX DEVICE; ULTRAVIOLET SPECTROMETERS; WAVELENGTHS
- Descriptors DEC
- CLOSED PLASMA DEVICES; ELECTROMAGNETIC RADIATION; IMPURITIES; MAGNETIC MIRRORS; MEASURING INSTRUMENTS; OPEN PLASMA DEVICES; PINCH DEVICES; PINCH EFFECT; RADIATIONS; REVERSED-FIELD PINCH DEVICES; SPECTROMETERS; TANDEM MIRRORS; THERMONUCLEAR DEVICES; TOROIDAL PINCH DEVICES; ULTRAVIOLET RADIATION
Optional Information
- Notes
- (c) 2004 American Institute of Physics