Transparent conductive Ga-doped MgZnO/Ag/Ga-doped MgZnO sandwich structure with improved conductivity and transmittance
- 1. Department of Photonics Engineering, Yuan Ze University, Chung-Li, Taiwan (China)
- 2. Department of Electronics Engineering, Vanung University, Chung-Li, Taiwan (China)
Description
Highlights: ► Remarkable improvement of the GMZO/Ag/GMZO sandwich structure with resistivity of 10−5 Ω cm without thermal annealing. ► The optimal structural design shows an average transmittance of 81% at a wavelength range of 400–800 nm. ► The AFM were used to verify the morphological study for crystallite size. ► The SEM pictures show the aggregation of the Ag grain leading to the increase of light scattering. ► XPS measurements were employed to confirm the composition and the diffusion of Ag. -- Abstract: This study presents the advantages of combining Ga-doped MgZnO (GMZO) transparent conductive oxide (TCO) with a silver (Ag) layer to form a GMZO/Ag/GMZO composite structure using a radio-frequency magnetron sputtering and electron beam system. The proposed structure improves the electrical properties of a single GMZO bulk and allows a low processing temperature. This study also investigates the effects of the silver thickness and post-annealing process on the structural, electrical, and optical properties of the GMZO/Ag/GMZO composite sandwich structure. The optimal GMZO/Ag/GMZO structural thickness was 40/20/60 nm, which yielded a resistivity of 5.8 × 10−5 Ω cm with an average transmittance of 81.0% at a wavelength range of 400–800 nm. The figure of merit (ΦTC) for the as-deposited sandwich structure was calculated as 2.1 × 10−2 Ω−1. This is approximately two times higher than the best results obtained from a single GMZO bulk layer with an annealing temperature of 600 °C (1.1 × 10−2 Ω−1). This remarkable improvement of the GMZO/Ag/GMZO sandwich structure is a highly promising candidate for optoelectronic devices, and has a low processing temperature than a single TCO bulk layer
Availability note (English)
Available from http://dx.doi.org/10.1016/j.jallcom.2013.01.189Additional details
Identifiers
- DOI
- 10.1016/j.jallcom.2013.01.189;
- PII
- S0925-8388(13)00271-5;
Publishing Information
- Journal Title
- Journal of Alloys and Compounds
- Journal Volume
- 564
- Journal Page Range
- p. 105-113
- ISSN
- 0925-8388
- CODEN
- JALCEU
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 45044062
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ANNEALING; ATOMIC FORCE MICROSCOPY; DOPED MATERIALS; ELECTRICAL PROPERTIES; ELECTRON BEAMS; LAYERS; MAGNETRONS; OPTICAL PROPERTIES; OXIDES; RADIOWAVE RADIATION; SCANNING ELECTRON MICROSCOPY; SILVER; THICKNESS; X-RAY DIFFRACTION; X-RAY PHOTOELECTRON SPECTROSCOPY
- Descriptors DEC
- BEAMS; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; DIMENSIONS; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; ELEMENTS; EQUIPMENT; HEAT TREATMENTS; LEPTON BEAMS; MATERIALS; METALS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXYGEN COMPOUNDS; PARTICLE BEAMS; PHOTOELECTRON SPECTROSCOPY; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SPECTROSCOPY; TRANSITION ELEMENTS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.