Published 1990 | Version v1
Book

Nonlinear sheath motion and stochastic heating in a capacitive RF discharge

  • 1. California Univ., Berkeley, CA (USA)

Description

Low pressure (<100 mTorr) capacitive r.f. discharges are widely used in the electronics industry. It has been shown that stochastic heating by the oscillating sheaths is a major energy deposition mechanism. An analytical model of the sheath motion predicts that the heating rate is sensitively dependent on the detailed shape of the non-sinusoidal sheath motion. An experimental procedure has been developed for detrermining this sheath motion. A high frequency response, Langmuir probe measures the sheath potential throughout the sheath region, as a function of position and time. The probe-discharge system can be modeled as a non-linear capacitive voltage divider. Incorporating the non-linear sheath motion into this circuit model yields a set of equations that are solved numerically, and the resulting waveforms are compared with the experimental observations both in magnitude and harmonic content. The parameters describing the sheath motion can then be varied to match the experimentally observed potential. The results indicate good agreement between the theoretically predicted and experimentally observed sheath motion. The differences between the theory and experiment are discussed

Additional details

Publishing Information

Publisher
IEEE Service Center.
Imprint Place
Piscataway, NJ (USA)
Imprint Title
1990 IEEE international conference on plasma science-Conference Record-Abstracts
Imprint Pagination
231 p.
Journal Page Range
p. 184.

Conference

Title
17. IEEE international conference on plasma science (ICOPS 17).
Dates
21-23 May 1990.
Place
Oakland, CA (USA).

INIS

Country of Publication
United States
Country of Input or Organization
United States
INIS RN
22057384
Subject category
S75: CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY;
Resource subtype / Literary indicator
Conference
Descriptors DEI
CAPACITANCE; CORRELATIONS; HEATING; HIGH-FREQUENCY DISCHARGES; ION IMPLANTATION; LANGMUIR PROBE; NONLINEAR PROBLEMS; PLASMA SHEATH; PRESSURE DEPENDENCE; STOCHASTIC PROCESSES
Descriptors DEC
ELECTRIC DISCHARGES; ELECTRIC PROBES; ELECTRICAL PROPERTIES; PHYSICAL PROPERTIES; PROBES

Optional Information

Secondary number(s)
CONF-900585--.