Published March 7, 2008 | Version v1
Journal article

In-plane anisotropy formation of Co thin film induced by FeMn covering layer

  • 1. Key Laboratory for Magnetism and Magnetic Materials of MOE, Lanzhou University, Lanzhou 730000 (China)

Description

A Co (40 nm) thin film and a Co (40 nm)/Fe50Mn50(15 nm) bilayer are fabricated by radio frequency magnetron sputtering on a Si substrate. It is found that the Fe50Mn50 covering layer results in a decrease in the coercivity of the Co thin film. After high-vacuum magnetic heat treatments at 240 and 300 deg. C, a significant uniaxial anisotropy is induced only in the bilayer. A resonance peak at 3 GHz of the annealed bilayer is found in the permeability spectrum. The temperature dependence of magnetic hysteresis loops shows that the uniaxial anisotropy is related to the exchange coupling between the ferromagnet and the antiferromagnet layer

Availability note (English)

Available from http://dx.doi.org/10.1088/0022-3727/41/5/055002

Additional details

Identifiers

DOI
10.1088/0022-3727/41/5/055002;
PII
S0022-3727(08)57588-7;

Publishing Information

Journal Title
Journal of Physics. D, Applied Physics
Journal Volume
41
Journal Issue
5
Journal Page Range
[4 p.]
ISSN
0022-3727
CODEN
JPAPBE