Current-Transport Mechanisms in the AlInN/AlN/GaN single-channel and AlInN/AlN/GaN/AlN/GaN double-channel heterostructures
- 1. Nanotechnology Research Center, Department of Physics, Department of Electrical and Electronics Engineering, Bilkent University, Bilkent, 06800 Ankara (Turkey)
- 2. Department of Physics, Faculty of Science and Letters, Balıkesir University, Çağış Kampüsü, 10145 Balıkesir (Turkey)
Description
Current-transport mechanisms were investigated in Schottky contacts on AlInN/AlN/GaN single channel (SC) and AlInN/AlN/GaN/AlN/GaN double channel (DC) heterostructures. A simple model was adapted to the current-transport mechanisms in DC heterostructure. In this model, two Schottky diodes are in series: one is a metal–semiconductor barrier layer (AIInN) Schottky diode and the other is an equivalent Schottky diode, which is due to the heterojunction between the AlN and GaN layer. Capacitance–voltage studies show the formation of a two-dimensional electron gas at the AlN/GaN interface in the SC and the first AlN/GaN interface from the substrate direction in the DC. In order to determine the current mechanisms for SC and DC heterostructures, we fit the analytical expressions given for the tunneling current to the experimental current–voltage data over a wide range of applied biases as well as at different temperatures. We observed a weak temperature dependence of the saturation current and a fairly small dependence on the temperature of the tunneling parameters in this temperature range. At both a low and medium forward-bias voltage values for Schottky contacts on AlInN/AlN/GaN/AlN/GaN DC and AlInN/AlN/GaN SC heterostructures, the data are consistent with electron tunneling to deep levels in the vicinity of mixed/screw dislocations in the temperature range of 80–420 K. - Highlights: • Current mechanisms were investigated on single and double channel heterostructures. • A model was adapted to the current mechanisms in double channel heterostructures. • We observed a weak temperature dependence of the saturation current. • And a small dependence of the tunneling parameters in this temperature range
Availability note (English)
Available from http://dx.doi.org/10.1016/j.tsf.2013.09.026Additional details
Identifiers
- DOI
- 10.1016/j.tsf.2013.09.026;
- PII
- S0040-6090(13)01494-6;
Publishing Information
- Journal Title
- Thin Solid Films
- Journal Volume
- 548
- Journal Page Range
- p. 411-418
- ISSN
- 0040-6090
- CODEN
- THSFAP
INIS
- Country of Publication
- Netherlands
- Country of Input or Organization
- International Atomic Energy Agency (IAEA)
- INIS RN
- 46128520
- Subject category
- S36: MATERIALS SCIENCE;
- Descriptors DEI
- ALUMINIUM NITRIDES; CAPACITANCE; DEPLETION LAYER; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRON GAS; GALLIUM NITRIDES; HETEROJUNCTIONS; INDIUM NITRIDES; INTERFACES; SCHOTTKY BARRIER DIODES; SCREW DISLOCATIONS; SEMICONDUCTOR MATERIALS; SUBSTRATES; TEMPERATURE DEPENDENCE; TUNNEL EFFECT
- Descriptors DEC
- ALUMINIUM COMPOUNDS; CRYSTAL DEFECTS; CRYSTAL STRUCTURE; DISLOCATIONS; ELECTRICAL PROPERTIES; GALLIUM COMPOUNDS; INDIUM COMPOUNDS; LAYERS; LINE DEFECTS; MATERIALS; NITRIDES; NITROGEN COMPOUNDS; PHYSICAL PROPERTIES; PNICTIDES; SEMICONDUCTOR DEVICES; SEMICONDUCTOR DIODES; SEMICONDUCTOR JUNCTIONS
Optional Information
- Copyright
- Copyright (c) 2013 Elsevier Science B.V., Amsterdam, The Netherlands, All rights reserved.