Published June 25, 2012 | Version v1
Journal article Metadata-only

Enhanced electrical and noise properties of nanocomposite vanadium oxide thin films by reactive pulsed-dc magnetron sputtering

Creators

  • 1. Department of Engineering Sciences and Mechanics, Penn State University, University Park, Pennsylvania 16802 (United States)
  • 2. Department of Electrical Engineering, Penn State University, University Park, Pennsylvania 16802 (United States)
  • 3. Department of Materials Science and Engineering, North Carolina State University, Raleigh, North Carolina 27695 (United States)
  • 4. Materials Research Institute, Penn State University, University Park, Pennsylvania 16802 (United States)

Description

Thin films of VOx (1.3 ≤ x ≤ 2) were deposited by reactive pulsed-dc magnetron sputtering of a vanadium metal target while RF-biasing the substrate. Rutherford back scattering, glancing angle x-ray, and cross-sectional transmission electron microscopy measurements revealed the formation of nanocolumns with nanotwins within VOx samples. The resistivity of nanotwinned VOx films ranged from 4 mΩ·cm to 0.6 Ω·cm and corresponding temperature coefficient of resistance between -0.1% and -2.6% per K, respectively. The 1/f electrical noise was analyzed in these VOx samples using the Hooge-Vandamme relation. These VOx films are comparable or surpass commercial VOx films deposited by ion beam sputtering.

Additional details

Identifiers

DOI
10.1063/1.4731240;

Publishing Information

Journal Title
Applied Physics Letters
Journal Volume
100
Journal Issue
26
Journal Page Range
p. 262108-262108.4
ISSN
0003-6951
CODEN
APPLAB

INIS

Country of Publication
United States
Country of Input or Organization
International Atomic Energy Agency (IAEA)
INIS RN
44039204
Subject category
S36: MATERIALS SCIENCE;
Descriptors DEI
BACKSCATTERING; DEPOSITION; ELECTRIC CONDUCTIVITY; ION BEAMS; MAGNETRONS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; SUBSTRATES; THIN FILMS; TRANSMISSION ELECTRON MICROSCOPY; VANADIUM OXIDES; X RADIATION; X-RAY DIFFRACTION
Descriptors DEC
BEAMS; CHALCOGENIDES; COHERENT SCATTERING; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTROMAGNETIC RADIATION; ELECTRON MICROSCOPY; ELECTRON TUBES; ELECTRONIC EQUIPMENT; EQUIPMENT; FILMS; IONIZING RADIATIONS; MICROSCOPY; MICROWAVE EQUIPMENT; MICROWAVE TUBES; OXIDES; OXYGEN COMPOUNDS; PHYSICAL PROPERTIES; RADIATIONS; SCATTERING; SPECTROSCOPY; TRANSITION ELEMENT COMPOUNDS; VANADIUM COMPOUNDS

Optional Information

Notes
(c) 2012 American Institute of Physics